• GXT18A-01 UV light cleaning machine

  • UVXT16-1 UV light cleaning machine

  • GXP-SP UV Photoelectric Cleaning Machine

  • Online light cleaning machine

  • GXT10A-01 light cleaning machine

  • Light cleaning machine patent

  • Expert group appraisal opinion

Introduction of UV light cleaning machine

Ultraviolet light surface cleaning technology was proposed in the world with the development of optoelectronic information industry. In the mid-1970s, the U.S. military electronic technology and device laboratory applied ultraviolet light irradiation to clean quartz wafers and achieved satisfactory results. However, for a long time in the United States, UV surface cleaning technology has been mainly used for research applications in the military field. Until the early 1990s, Japan and the United States successively applied UV light cleaning machines to the industrial production process of civilian optoelectronic products, and began to provide UV light cleaning machines to individual foreign-funded LCD enterprises in China under the condition of technical confidentiality. Subsequently, while Japan is developing UV surface cleaning technology, UV surface modification technology has also been developed. At the end of the 20th century, Japan and other advanced industrial countries have gradually expanded the technology of UV surface cleaning and modification from the information industry to industrial production processes such as metal, plastic, and rubber. In the late 1990s, my country's information technology and industry developed rapidly at an astonishing speed, especially the rapid development of flat panel display technology. enter the market. As a result, the surface quality requirements for the preparation process are becoming more and more stringent, the superiority of UV surface cleaning technology has been widely recognized, and the demand for UV light cleaning machines is increasing. (Company and founder introduction) Beijing Aerospace Hongda Optoelectronics Technology Co., Ltd. is a high-tech enterprise registered in Beijing Zhongguancun Haidian Hi-Tech Park. Founded in 1994 , the company was mainly engaged in the processing and technical services of military products in the initial stage.


2001the company has focused on the development and application of special light sources in the field of purification, and has successively developed vacuum ultraviolet spectrometers, light cleaning machines, special light source power supplies, a series of air purifiers and water treatment products . The vacuum ultraviolet spectrometer has been adopted by famous foreign enterprises and filled the domestic blank of this product. The vacuum ultraviolet light cleaning machine has obtained the national invention patent and won the Haidian Park Innovation Fund in 2003 .

Beijing Aerospace Hongda Optoelectronics Technology Co., Ltd. is a high-tech enterprise integrating the research, design, production and sales of optical cleaning technology and optical cleaning machines. Relying on its own strength, the company has successfully developed a series of industrialized UV light cleaning machines with the world's advanced level. Reach the foreign advanced level. After the ITO glass substrate was optically cleaned by the Auger electron spectrometer of the Analysis Center of the Department of Chemistry, Tsinghua University, the atomic cleanliness was achieved.
The light cleaning machine obtained the invention patent certificate issued by the State Intellectual Property Office (patent number: ZL03 1 49541.9), and the authorization date was December 13, 2006. Our company is currently a unit specializing in the development, production and sales of light cleaning machines and has obtained the authorization of the invention patent of UV light cleaning machine. It is also one of the few companies in the world that can independently develop and produce all the core components and control systems of the whole machine!

Principle introduction
The basic principle of optical cleaning is different from traditional cleaning techniques such as chemical method and physical method (eg ultrasonic), and it is also quite different from the newly developed plasma cleaning and laser cleaning. It mainly applies photochemical principles and technologies, and the key technology lies in special high-power short-wave ultraviolet and vacuum ultraviolet light sources. The principle is to use photon energy to break the macromolecular chain and macromolecular chain of organic matter into small molecules, atoms, free radicals, etc.; and to convert oxygen molecules in the air into ozone O 3 . O 3 is then acted by photons to generate excited oxygen atoms O * , O * will strongly oxidize the broken organic substances into CO, CO 2 , H 2 O and other volatilization, which will be discharged with the exhaust gas without leaving any traces, which is a dry Non-contact type; no damage under normal temperature and atmospheric pressure, no chemicals are used, no secondary pollution for environmental protection; special cleaning effect on the most difficult to clean grease and organic pollutants on the surface of objects.

The working principle of light cleaning is to use high-energy photons of specific wavelengths of ultraviolet (UV) and vacuum ultraviolet (VUV) to cut off the polymer chains of organic pollutants (such as oil, fingerprints, etc.), and generate odorous O3 under VUV irradiation. It releases active oxygen atoms; it has a strong oxidizing property, and it oxidizes the broken polymer to generate co, CO2, H2O gasification, and is discharged with the exhaust system to achieve the characteristics of dry method, no residue, and high cleanliness. . The features of this project are:

1. High-intensity UV/VUV special ultraviolet light source, adopts high transmittance to VUV, low-hydroxyl quartz tube, and adopts serpentine tube to increase the positive column area. Adopt special gas and filler comparison and temperature controllable cold point, adopt high tube wall load design and cold point controllable technology to ensure high strength and constant temperature characteristics;

2.Research and develop vacuum ultraviolet spectrometers for VUV (including UV) to ensure the test requirements of light source characteristics and material characteristics, which is an important technical guarantee for research and development of light sources;

3.System use temperature, pressure.

4.Various sensors such as concentration, ultraviolet illuminance, controllable valves, temperature controller and transmission system are integrated and optimally controlled by a microprocessor to make the photochemical reaction atmosphere in the best state;

5.The system adopts an independent self-purification closed-loop system. The pressure of each point of the system is controlled by the microprocessor to ensure that the internal Q does not leak: external dust does not enter, and the cleanliness of the internal clean room is higher than that of the external environment (referring to the workshop or the studio where the equipment is located) Completely solve the problem of the online opening system Internal equivalent closed working conditions; 

6.Adopt advanced Q exhaust gas treatment technology, photothermal composite treatment technology of UV irradiation and auxiliary heating method. And set aside the interface for comprehensive utilization of Q exhaust gas.