Aerospace Hongda UB series ballasts can be applied to UV light sources from 4W to 350W, with strong anti-interference, efficiency greater than 90%, high reliability: with short-circuit and open-circuit protection functions, a wide range of environmental adaptation temperature: -25 ℃—+70℃. There are DC 12V and 24V input types, and AC 110V and 220V input types, respectively.
HD-2011 series oil fume purification device is under the strong support of foreign technologies, in strict accordance with "Fume Purifier for Catering Industry" (HCRJ 048-1999) and "Technical Requirements and Testing Specifications for Fume Purification Equipment in Catering Industry" (HJ/T62-2001) It is designed and manufactured under the specified technical conditions.
A 185nm special ultraviolet lamp is used to cut off the oil molecular chain to form small oil molecules. At the same time, this ultraviolet light reacts with oxygen in the air to generate ozone. White powder, the organic matter in the oil fume is oxidized by photolysis, and the odor in the flue is also eliminated.
The system uses the latest UV technology. The system adopts high-efficiency low-pressure and high-intensity UV amalgam lamps, so that the system can automatically adjust the output energy of UV lamps in real time according to changes in flow rate and influent water quality to optimize system energy consumption.
The highly flexible HDUV water treatment system has fully demonstrated its high efficiency and reliability of disinfection performance in application cases. Minimize maintenance and costs. It is very suitable for water plants with large flow changes, as well as water plants that need to treat complex and low-quality water bodies (sewage and overflow) and advanced treatment of tertiary water bodies. Suitable for small and medium-sized sewage treatment systems ( below 100,000 tons / day)
In addition to the various processes that need to be cleaned in the production of liquid crystal, the ultraviolet radiation cleaning machine also has a very wide range of fields such as:
1. Wafer cleaning (ITO glass, optical glass, chrome plate, mask plate, polished quartz crystal, silicon);
2. Precise cleaning of metals with oxide films;
3. In liquid crystal display devices, semiconductor silicon wafers;
4. Integrated circuits, high-precision printed circuit boards;
5. Optical devices, sealing technology.